Patents
6529007
794I92ZR
items
1
mla
0
date
dsc
39
https://steam.me.gatech.edu/wp-content/plugins/zotpress/
%7B%22status%22%3A%22success%22%2C%22updateneeded%22%3Afalse%2C%22instance%22%3A%22zotpress-a501c3bc5dbd9793ce6144a616dc6cf6%22%2C%22meta%22%3A%7B%22request_last%22%3A0%2C%22request_next%22%3A0%2C%22used_cache%22%3Atrue%7D%2C%22data%22%3A%5B%7B%22key%22%3A%225TTDRHV4%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20and%20Panas%22%2C%22parsedDate%22%3A%222022-09-13%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20and%20Robert%20M.%20Panas.%20%3Ci%3EThree-Dimensional%20Rechargeable%20Battery%20with%20Solid-State%20Electrolyte%3C%5C%2Fi%3E.%20US%20Patent%2011444347B2%2C%2013%20Sept.%202022%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11444347B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11444347B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22Three-dimensional%20rechargeable%20battery%20with%20solid-state%20electrolyte%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Robert%20M.%22%2C%22lastName%22%3A%22Panas%22%7D%5D%2C%22abstractNote%22%3A%22%22%2C%22country%22%3A%22US%22%2C%22assignee%22%3A%22Lawrence%20Livermore%20National%20Security%20LLC%22%2C%22issuingAuthority%22%3A%22United%20States%22%2C%22patentNumber%22%3A%22US%20Patent%2011444347B2%22%2C%22filingDate%22%3A%222018-02-28%22%2C%22applicationNumber%22%3A%22US16651777%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222022-09-13%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11444347B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222023-11-17T16%3A15%3A50Z%22%7D%7D%2C%7B%22key%22%3A%22WGSN6CE4%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20et%20al.%22%2C%22parsedDate%22%3A%222022-04-26%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20Kumar%2C%20et%20al.%20%3Ci%3ESystem%20and%20Method%20for%20Sub%20Micron%20Additive%20Manufacturing%3C%5C%2Fi%3E.%20US%20Patent%2011312067B2%2C%2026%20Apr.%202022%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11312067B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11312067B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22System%20and%20method%20for%20sub%20micron%20additive%20manufacturing%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20Kumar%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Robert%20Matthew%22%2C%22lastName%22%3A%22Panas%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Shih-Chi%22%2C%22lastName%22%3A%22Chen%22%7D%5D%2C%22abstractNote%22%3A%22%22%2C%22country%22%3A%22US%22%2C%22assignee%22%3A%22Lawrence%20Livermore%20National%20Security%20LLC%22%2C%22issuingAuthority%22%3A%22United%20States%22%2C%22patentNumber%22%3A%22US%20Patent%2011312067B2%22%2C%22filingDate%22%3A%222017-12-29%22%2C%22applicationNumber%22%3A%22US15857917%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222022-04-26%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11312067B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222022-05-10T15%3A31%3A57Z%22%7D%7D%2C%7B%22key%22%3A%22J2TMU5HR%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20et%20al.%22%2C%22parsedDate%22%3A%222021-10-19%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%2C%20et%20al.%20%3Ci%3ESystem%20and%20Method%20for%20Curved%20Light%20Sheet%20Projection%20during%20Two-Photon%20Polymerization%3C%5C%2Fi%3E.%20US%20Patent%2011150484%2C%2019%20Oct.%202021%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11150484B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11150484B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22System%20and%20method%20for%20curved%20light%20sheet%20projection%20during%20two-photon%20polymerization%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Shih-Chi%22%2C%22lastName%22%3A%22Chen%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Yina%22%2C%22lastName%22%3A%22Chang%22%7D%5D%2C%22abstractNote%22%3A%22%22%2C%22country%22%3A%22US%22%2C%22assignee%22%3A%22Lawrence%20Livermore%20National%20Security%20LLC%22%2C%22issuingAuthority%22%3A%22USPTO%22%2C%22patentNumber%22%3A%22US%20Patent%2011150484%22%2C%22filingDate%22%3A%222018-05-18%22%2C%22applicationNumber%22%3A%22US15983872%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222021-10-19%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS11150484B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222022-05-10T15%3A32%3A05Z%22%7D%7D%2C%7B%22key%22%3A%22GJCA2WJQ%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20and%20Oakdale%22%2C%22parsedDate%22%3A%222020-09-22%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20and%20James%20S.%20Oakdale.%20%3Ci%3EOptically%20Clear%20Photo-Polymerization%20Resists%20for%20Additive%20Manufacturing%20of%20Radiopaque%20Parts%3C%5C%2Fi%3E.%20US%20Patent%2010781315%2C%2022%20Sept.%202020%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10781315B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10781315B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22Optically%20clear%20photo-polymerization%20resists%20for%20additive%20manufacturing%20of%20radiopaque%20parts%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22James%20S.%22%2C%22lastName%22%3A%22Oakdale%22%7D%5D%2C%22abstractNote%22%3A%22According%20to%20one%20embodiment%2C%20a%20method%20includes%20contacting%20a%20triiodobenzoic%20acid%20with%20an%20oxalyl%20chloride%20in%20a%20solvent%20whereby%20triiodobenzoyl%20chloride%20is%20formed%2C%20contacting%20diethanolamine%20with%20triiodobenzoyl%20chloride%20where%20triiodobenzoic%20diol%20amine%20is%20formed%2C%20and%20forming%20an%20acrylate%20of%20triiodobenzoic%20diol%20amine%20with%20acryloyl%20chloride%20where%20an%20organoiodine%20compound%20is%20formed.%20According%20to%20another%20embodiment%2C%20an%20optically%20clear%20photopolymer%20resist%20blend%20for%20additive%20manufacturing%20includes%20a%20radiopaque%20pre-polymer%20compound%20where%20the%20compound%20includes%20at%20least%20one%20of%20the%20following%3A%20iodine%2C%20bromine%2C%20tin%2C%20lead%2C%20or%20bismuth.%20The%20resist%20blend%20also%20includes%20a%20photoinitiator%2C%20a%20polymerization%20inhibitor%2C%20and%20a%20base%20pre-polymer.%22%2C%22country%22%3A%22%22%2C%22assignee%22%3A%22%22%2C%22issuingAuthority%22%3A%22%22%2C%22patentNumber%22%3A%22US%20Patent%2010781315%22%2C%22filingDate%22%3A%22%22%2C%22applicationNumber%22%3A%22%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222020-9-22%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10781315B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222021-01-20T16%3A43%3A50Z%22%7D%7D%2C%7B%22key%22%3A%22E948D8B8%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20et%20al.%22%2C%22parsedDate%22%3A%222019-10-22%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20et%20al.%20%3Ci%3EMicroscale%20Sensors%20for%20Direct%20Metrology%20of%20Additively%20Manufactured%20Features%3C%5C%2Fi%3E.%20US%20Patent%2010451539%2C%2022%20Oct.%202019%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10451539B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10451539B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22Microscale%20sensors%20for%20direct%20metrology%20of%20additively%20manufactured%20features%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Robert%20Panas%22%2C%22lastName%22%3A%22Panas%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Michael%20A.%22%2C%22lastName%22%3A%22Cullinan%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Ian%20S.%22%2C%22lastName%22%3A%22Ladner%22%7D%5D%2C%22abstractNote%22%3A%22This%20invention%20relates%20to%20a%20microelectromechanical%20device%20for%20mechanical%20characterization%20of%20a%20specimen.%20In%20one%20embodiment%20the%20device%20may%20incorporate%20a%20substrate%2C%20at%20least%20one%20first%20flexure%20bearing%20and%20at%20least%20one%20second%20flexure%20bearing%2C%20both%20being%20supported%20on%20the%20substrate.%20First%20and%20second%20movable%20shuttles%20may%20be%20used%20which%20are%20supported%20above%20the%20substrate%20by%20the%20flexure%20bearings%20so%20that%20each%20is%20free%20to%20move%20linearly%20relative%20to%20the%20substrate.%20Ends%20of%20the%20movable%20shuttles%20are%20separated%20by%20a%20gap.%20A%20thermal%20actuator%20may%20be%20connected%20to%20one%20end%20of%20the%20first%20movable%20shuttle%2C%20and%20operates%20to%20cause%20the%20first%20movable%20shuttle%20to%20move%20in%20a%20direction%20parallel%20to%20the%20surface%20of%20the%20substrate%20in%20response%20to%20a%20signal%20applied%20to%20the%20thermal%20actuator.%20A%20first%20capacitive%20sensor%20may%20be%20formed%20between%20the%20first%20movable%20shuttle%20and%20the%20substrate%2C%20and%20a%20second%20capacitive%20sensor%20formed%20between%20the%20second%20movable%20shuttle%20and%20the%20substrate.%22%2C%22country%22%3A%22USA%22%2C%22assignee%22%3A%22%22%2C%22issuingAuthority%22%3A%22USPTO%22%2C%22patentNumber%22%3A%22US%20Patent%2010451539%22%2C%22filingDate%22%3A%22%22%2C%22applicationNumber%22%3A%22%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222019-10-22%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10451539B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222020-04-14T04%3A35%3A55Z%22%7D%7D%2C%7B%22key%22%3A%22ZS4TPNKI%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%22%2C%22parsedDate%22%3A%222018-12-04%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%20%3Ci%3EMethod%20to%20Suppress%20Period%20Doubling%20during%20Manufacture%20of%20Micro%20and%20Nano%20Scale%20Wrinkled%20Structures%3C%5C%2Fi%3E.%20US%20Patent%2010144172%2C%204%20Dec.%202018%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10144172B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10144172B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22Method%20to%20suppress%20period%20doubling%20during%20manufacture%20of%20micro%20and%20nano%20scale%20wrinkled%20structures%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%5D%2C%22abstractNote%22%3A%22The%20range%20of%20stretch-tunability%20of%20sinusoidal%20wrinkled%20surfaces%20that%20are%20obtained%20by%20compression%20of%20supported%20thin%20films%20is%20limited%20by%20the%20emergence%20of%20a%20period-doubled%20mode%20at%20high%20compressive%20strains.%20This%20disclosure%20presents%20a%20method%20to%20suppress%20the%20emergence%20of%20the%20period-doubled%20mode%20at%20high%20strains.%20This%20is%20achieved%20by%20compressing%20pre-patterned%20supported%20thin%20films%2C%20wherein%20the%20pre-patterns%20are%20substantially%20similar%20to%20the%20natural%20pattern%20of%20the%20supported%20thin%20film%20system.%20As%20compared%20to%20flat%20thin%20film%20systems%2C%20pre-patterned%20thin%20film%20systems%20exhibit%20period%20doubling%20behavior%20at%20a%20higher%20compressive%20strain.%20The%20onset%20strain%20for%20emergence%20of%20period-doubling%20is%20tuned%20by%20altering%20the%20amplitude%20of%20the%20pre-patterns.%22%2C%22country%22%3A%22%22%2C%22assignee%22%3A%22%22%2C%22issuingAuthority%22%3A%22USPTO%22%2C%22patentNumber%22%3A%22US%20Patent%2010144172%22%2C%22filingDate%22%3A%22%22%2C%22applicationNumber%22%3A%22%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222018-12-04%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10144172B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222020-04-14T04%3A38%3A07Z%22%7D%7D%2C%7B%22key%22%3A%22NAEP777J%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20and%20Culpepper%22%2C%22parsedDate%22%3A%222018-08-21%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20and%20Martin%20L.%20Culpepper.%20%3Ci%3EWrinkled%20Surfaces%20with%20Tunable%20Hierarchy%20and%20Methods%20for%20the%20Preparation%20Thereof%3C%5C%2Fi%3E.%20US%20Patent%2010052811%2C%2021%20Aug.%202018%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10052811B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10052811B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22Wrinkled%20surfaces%20with%20tunable%20hierarchy%20and%20methods%20for%20the%20preparation%20thereof%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Martin%20L.%22%2C%22lastName%22%3A%22Culpepper%22%7D%5D%2C%22abstractNote%22%3A%22This%20invention%20relates%20to%20the%20low-cost%20manufacture%20of%20a%20tunable%20physical%20topographic%20pattern%20and%20more%20particularly%20to%20the%20manufacture%20of%20micro%20and%20nano%20scale%20hierarchical%20periodic%20wrinkle%20patterns%20that%20are%20generated%20upon%20compression%20of%20supported%20thin%20films.%20Disclosed%20herein%20is%20%28i%29%20a%20composite%20material%20with%20tunable%20hierarchical%20wrinkle%20patterns%2C%20wherein%20the%20composite%20material%20comprises%20a%20stretched%20and%20pre-patterned%20base%20layer%20and%20a%20thin%20film%20that%20is%20conformally%20attached%20to%20the%20pre-patterned%20surface%20of%20the%20base%20layer%2C%20%28ii%29%20a%20method%20of%20fabricating%20the%20pre-patterned%20base%20via%20pattern%20replication%2C%20and%20%28iii%29%20a%20method%20of%20fabricating%20tunable%20hierarchical%20wrinkle%20patterns%2C%20wherein%20the%20pattern%20can%20be%20deterministically%20switched%20across%20the%20hierarchical%20and%20non-hierarchical%20states%20via%20strain%20control.%22%2C%22country%22%3A%22%22%2C%22assignee%22%3A%22%22%2C%22issuingAuthority%22%3A%22%22%2C%22patentNumber%22%3A%22US%20Patent%2010052811%22%2C%22filingDate%22%3A%22%22%2C%22applicationNumber%22%3A%22%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222018-08-21%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS10052811B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222020-04-14T04%3A40%3A41Z%22%7D%7D%2C%7B%22key%22%3A%222BZUCPWK%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20and%20Culpepper%22%2C%22parsedDate%22%3A%222018-04-24%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20and%20Martin%20L.%20Culpepper.%20%3Ci%3EMethod%20to%20Fabricate%20Asymmetric%20Wrinkles%20Using%20Biaxial%20Strains%3C%5C%2Fi%3E.%20US%20Patent%209950462%2C%2024%20Apr.%202018%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9950462B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9950462B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22Method%20to%20fabricate%20asymmetric%20wrinkles%20using%20biaxial%20strains%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Martin%20L.%22%2C%22lastName%22%3A%22Culpepper%22%7D%5D%2C%22abstractNote%22%3A%22Wrinkling%20of%20supported%20thin%20films%20is%20a%20strain-driven%20phenomenon%20that%20enables%20scalable%20and%20low-cost%20fabrication%20of%20periodic%20micro%20and%20nano%20scale%20structures.%20The%20morphology%20of%20wrinkles%20depends%20on%20both%20the%20magnitude%20and%20the%20nature%20of%20compressive%20strains%20that%20are%20applied%20to%20the%20thin%20film.%20This%20disclosure%20presents%20the%20methods%20to%20fabricate%20asymmetric%202-D%20wrinkled%20structures%20using%20biaxial%20compressive%20strains.%20The%20method%20relies%20on%20the%20dependence%20of%20wrinkle%20morphology%20on%20both%20strains%20and%20strain%20paths%20to%20generate%20asymmetric%202D%20wrinkles.%20Asymmetry%20is%20achieved%20by%20deliberately%20traversing%20the%20system%20through%20a%20strain%20state%20that%20creates%20cracks%20along%20a%20preferential%20direction.%20Fabricated%20patterns%20include%20non-uniform%20zigzag%20wrinkles%20that%20demonstrate%20period%20doubling%20only%20along%20one%20direction.%22%2C%22country%22%3A%22%22%2C%22assignee%22%3A%22%22%2C%22issuingAuthority%22%3A%22%22%2C%22patentNumber%22%3A%22US%20Patent%209950462%22%2C%22filingDate%22%3A%22%22%2C%22applicationNumber%22%3A%22%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222018-04-24%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9950462B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222020-04-14T04%3A46%3A22Z%22%7D%7D%2C%7B%22key%22%3A%225ER93BTT%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20and%20Culpepper%22%2C%22parsedDate%22%3A%222017-11-21%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20and%20Martin%20L.%20Culpepper.%20%3Ci%3EMethod%20to%20Fabricate%20Pre-Patterned%20Surfaces%20during%20Manufacture%20of%20Complex%20Wrinkled%20Structures%3C%5C%2Fi%3E.%20US%20Patent%209821507%2C%2021%20Nov.%202017%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9821507B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9821507B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22Method%20to%20fabricate%20pre-patterned%20surfaces%20during%20manufacture%20of%20complex%20wrinkled%20structures%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Martin%20L.%22%2C%22lastName%22%3A%22Culpepper%22%7D%5D%2C%22abstractNote%22%3A%22The%20pattern%20complexity%20and%20functional%20value%20of%20wrinkled%20structures%20can%20be%20substantially%20increased%20by%20fabricating%20the%20wrinkles%20on%20pre-patterned%20quasi-planar%20substrates%20instead%20of%20flat%20substrates.%20This%20disclosure%20presents%20the%20methods%20for%20fabricating%20pre-patterned%20polymeric%20surfaces%20that%20can%20be%20subsequently%20used%20as%20the%20substrates%20during%20manufacture%20of%20complex%20wrinkled%20structures.%20Pre-patterned%20substrates%20are%20generated%20by%20imprinting%20the%20pre-patterns%20onto%20the%20substrates%20during%20the%20curing%20process.%20Suitability%20for%20post-curing%20use%20in%20fabrication%20of%20wrinkles%20is%20ensured%20by%20%28i%29%20delayed%20imprinting%20that%20occurs%20close%20to%20but%20before%20the%20gelation%20point%20and%20%28ii%29%20gradual%20alignment%20of%20pre-patterns%20to%20the%20direction%20of%20stretch%20that%20is%20applied%20later%20during%20manufacture%20of%20wrinkled%20structures.%22%2C%22country%22%3A%22%22%2C%22assignee%22%3A%22%22%2C%22issuingAuthority%22%3A%22%22%2C%22patentNumber%22%3A%22US%20Patent%209821507%22%2C%22filingDate%22%3A%22%22%2C%22applicationNumber%22%3A%22%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222017-11-21%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9821507B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222020-04-14T04%3A42%3A09Z%22%7D%7D%2C%7B%22key%22%3A%22CAKT2C7C%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20and%20Culpepper%22%2C%22parsedDate%22%3A%222017-03-21%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20and%20Martin%20L.%20Culpepper.%20%3Ci%3EBiaxial%20Tensile%20Stage%20for%20Fabricating%20and%20Tuning%20Wrinkles%3C%5C%2Fi%3E.%20US%20Patent%209597833%2C%2021%20Mar.%202017%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9597833B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9597833B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22Biaxial%20tensile%20stage%20for%20fabricating%20and%20tuning%20wrinkles%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Martin%20L.%22%2C%22lastName%22%3A%22Culpepper%22%7D%5D%2C%22abstractNote%22%3A%22Wrinkling%20of%20thin%20films%20is%20a%20strain-driven%20process%20that%20enables%20scalable%20and%20low-cost%20fabrication%20of%20periodic%20micro%20and%20nano%20scale%20patterns.%20However%2C%20real-world%20application%20is%20limited%20by%20the%20inability%20of%20current%20tools%20to%20provide%20the%20means%20for%20applying%20large%2C%20accurate%2C%20and%20non-equal%20biaxial%20strains%20via%20a%20device%20that%20can%20fit%20within%20the%20vacuum%20chambers%20that%20are%20required%20for%20thin%20film%20deposition%5C%2Fgrowth%20during%20wrinkling.%20The%20present%20biaxial%20tensile%20stage%20is%20a%20compact%20system%20that%20enables%20one%20to%20apply%20large%20and%20accurate%20non-equal%20biaxial%20strains%20to%20elastomeric%20films.%20It%20consists%20of%20%28i%29%20fixtures%20to%20clamp%20and%20hold%20films%20onto%20the%20stage%2C%20%28ii%29%20linear%20bearings%20for%20motion%20guidance%2C%20%28iii%29%20integrated%20actuators%20for%20real-time%20stretch%20control%2C%20%28iv%29%20base%20with%20kinematic%20coupling%20for%20registration%20to%20a%20metrology%20system%2C%20and%20%28v%29%20the%20structural%20frame.%22%2C%22country%22%3A%22%22%2C%22assignee%22%3A%22%22%2C%22issuingAuthority%22%3A%22%22%2C%22patentNumber%22%3A%22US%20Patent%209597833%22%2C%22filingDate%22%3A%22%22%2C%22applicationNumber%22%3A%22%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222017-03-21%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS9597833B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222020-04-14T04%3A43%3A25Z%22%7D%7D%2C%7B%22key%22%3A%22M9MTCG4Z%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20and%20Culpepper%22%2C%22parsedDate%22%3A%222014-09-16%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20and%20Martin%20L.%20Culpepper.%20%3Ci%3ESystem%20for%20Passive%20Alignment%20of%20Surfaces%3C%5C%2Fi%3E.%20US%20Patent%208834146%2C%2016%20Sept.%202014%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS8834146B2%5C%2Fen%27%3Ehttps%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS8834146B2%5C%2Fen%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22patent%22%2C%22title%22%3A%22System%20for%20passive%20alignment%20of%20surfaces%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22inventor%22%2C%22firstName%22%3A%22Martin%20L.%22%2C%22lastName%22%3A%22Culpepper%22%7D%5D%2C%22abstractNote%22%3A%22Passive%20stamp%20alignment%20system.%20The%20system%20includes%20a%20stamp%20supported%20by%20a%20stamp%20holder%20resting%20on%20three%20balls%20affixed%20to%20a%20top%20platform.%20A%20bottom%20platform%20supports%20a%20substrate%20to%20be%20aligned%20with%20the%20stamp.%20Means%20are%20provided%20for%20moving%20either%20the%20top%20or%20the%20bottom%20platform%20and%20holding%20the%20other%20platform%20stationary%20so%20as%20to%20contact%20the%20substrate%20with%20the%20stamp%20whereby%20the%20stamp%20holder%20is%20lifted%20away%20from%20each%20of%20the%20balls%20in%20sequence%20resulting%20in%20alignment%20of%20the%20stamp%20and%20the%20substrate%20parallel%20to%20each%20other.%22%2C%22country%22%3A%22%22%2C%22assignee%22%3A%22%22%2C%22issuingAuthority%22%3A%22%22%2C%22patentNumber%22%3A%22US%20Patent%208834146%22%2C%22filingDate%22%3A%22%22%2C%22applicationNumber%22%3A%22%22%2C%22priorityNumbers%22%3A%22%22%2C%22issueDate%22%3A%222014-09-16%22%2C%22references%22%3A%22%22%2C%22legalStatus%22%3A%22%22%2C%22language%22%3A%22en%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fpatents.google.com%5C%2Fpatent%5C%2FUS8834146B2%5C%2Fen%22%2C%22collections%22%3A%5B%22794I92ZR%22%5D%2C%22dateModified%22%3A%222020-04-14T04%3A44%3A43Z%22%7D%7D%5D%7D
Saha, Sourabh K., and Robert M. Panas. Three-Dimensional Rechargeable Battery with Solid-State Electrolyte. US Patent 11444347B2, 13 Sept. 2022, https://patents.google.com/patent/US11444347B2/en.
Saha, Sourabh Kumar, et al. System and Method for Sub Micron Additive Manufacturing. US Patent 11312067B2, 26 Apr. 2022, https://patents.google.com/patent/US11312067B2/en.
Saha, Sourabh, et al. System and Method for Curved Light Sheet Projection during Two-Photon Polymerization. US Patent 11150484, 19 Oct. 2021, https://patents.google.com/patent/US11150484B2/en.
Saha, Sourabh K., and James S. Oakdale. Optically Clear Photo-Polymerization Resists for Additive Manufacturing of Radiopaque Parts. US Patent 10781315, 22 Sept. 2020, https://patents.google.com/patent/US10781315B2/en.
Saha, Sourabh K., et al. Microscale Sensors for Direct Metrology of Additively Manufactured Features. US Patent 10451539, 22 Oct. 2019, https://patents.google.com/patent/US10451539B2/en.
Saha, Sourabh K. Method to Suppress Period Doubling during Manufacture of Micro and Nano Scale Wrinkled Structures. US Patent 10144172, 4 Dec. 2018, https://patents.google.com/patent/US10144172B2/en.
Saha, Sourabh K., and Martin L. Culpepper. Wrinkled Surfaces with Tunable Hierarchy and Methods for the Preparation Thereof. US Patent 10052811, 21 Aug. 2018, https://patents.google.com/patent/US10052811B2/en.
Saha, Sourabh K., and Martin L. Culpepper. Method to Fabricate Asymmetric Wrinkles Using Biaxial Strains. US Patent 9950462, 24 Apr. 2018, https://patents.google.com/patent/US9950462B2/en.
Saha, Sourabh K., and Martin L. Culpepper. Method to Fabricate Pre-Patterned Surfaces during Manufacture of Complex Wrinkled Structures. US Patent 9821507, 21 Nov. 2017, https://patents.google.com/patent/US9821507B2/en.
Saha, Sourabh K., and Martin L. Culpepper. Biaxial Tensile Stage for Fabricating and Tuning Wrinkles. US Patent 9597833, 21 Mar. 2017, https://patents.google.com/patent/US9597833B2/en.
Saha, Sourabh K., and Martin L. Culpepper. System for Passive Alignment of Surfaces. US Patent 8834146, 16 Sept. 2014, https://patents.google.com/patent/US8834146B2/en.
Software
6529007
442MWNWP
items
1
mla
0
date
dsc
39
https://steam.me.gatech.edu/wp-content/plugins/zotpress/
%7B%22status%22%3A%22success%22%2C%22updateneeded%22%3Afalse%2C%22instance%22%3A%22zotpress-ee90d29f1a9acaa58d022b7f489db90f%22%2C%22meta%22%3A%7B%22request_last%22%3A0%2C%22request_next%22%3A0%2C%22used_cache%22%3Atrue%7D%2C%22data%22%3A%5B%7B%22key%22%3A%22VXZX7A7B%22%2C%22library%22%3A%7B%22id%22%3A6529007%7D%2C%22meta%22%3A%7B%22creatorSummary%22%3A%22Saha%20and%20Culpepper%22%2C%22parsedDate%22%3A%222014-05-10%22%2C%22numChildren%22%3A0%7D%2C%22bib%22%3A%22%3Cdiv%20class%3D%5C%22csl-bib-body%5C%22%20style%3D%5C%22line-height%3A%202%3B%20padding-left%3A%201em%3B%20text-indent%3A-1em%3B%5C%22%3E%5Cn%20%20%3Cdiv%20class%3D%5C%22csl-entry%5C%22%3ESaha%2C%20Sourabh%20K.%2C%20and%20Martin%20L.%20Culpepper.%20%3Ci%3EMeshPerturb%3A%20MATLAB%20Codes%20for%20Mesh%20Perturbation%20and%20Automated%20Pre%20and%20Post%20Processing%20of%20Post-Bifurcation%20Analyses%20via%20COMSOL%3C%5C%2Fi%3E.%20MeshPerturb%201.0%2C%202014%2C%20%3Ca%20href%3D%27https%3A%5C%2F%5C%2Fhdl.handle.net%5C%2F1721.1%5C%2F86934%27%3Ehttps%3A%5C%2F%5C%2Fhdl.handle.net%5C%2F1721.1%5C%2F86934%3C%5C%2Fa%3E.%3C%5C%2Fdiv%3E%5Cn%3C%5C%2Fdiv%3E%22%2C%22data%22%3A%7B%22itemType%22%3A%22computerProgram%22%2C%22title%22%3A%22MeshPerturb%3A%20MATLAB%20codes%20for%20mesh%20perturbation%20and%20automated%20pre%20and%20post%20processing%20of%20post-bifurcation%20analyses%20via%20COMSOL%22%2C%22creators%22%3A%5B%7B%22creatorType%22%3A%22programmer%22%2C%22firstName%22%3A%22Sourabh%20K.%22%2C%22lastName%22%3A%22Saha%22%7D%2C%7B%22creatorType%22%3A%22programmer%22%2C%22firstName%22%3A%22Martin%20L.%22%2C%22lastName%22%3A%22Culpepper%22%7D%5D%2C%22abstractNote%22%3A%22%22%2C%22versionNumber%22%3A%22MeshPerturb%201.0%22%2C%22date%22%3A%222014%5C%2F5%5C%2F10%22%2C%22system%22%3A%22%22%2C%22company%22%3A%22%22%2C%22programmingLanguage%22%3A%22%22%2C%22ISBN%22%3A%22%22%2C%22url%22%3A%22https%3A%5C%2F%5C%2Fhdl.handle.net%5C%2F1721.1%5C%2F86934%22%2C%22collections%22%3A%5B%22442MWNWP%22%5D%2C%22dateModified%22%3A%222020-04-14T04%3A49%3A46Z%22%7D%7D%5D%7D
Saha, Sourabh K., and Martin L. Culpepper. MeshPerturb: MATLAB Codes for Mesh Perturbation and Automated Pre and Post Processing of Post-Bifurcation Analyses via COMSOL. MeshPerturb 1.0, 2014, https://hdl.handle.net/1721.1/86934.