Publications – Scalable Technologies for Advanced Manufacturing Laboratory

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6529007 U5QP88MT 1 apa 50 date year 11 https://steam.me.gatech.edu/wp-content/plugins/zotpress/

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Lee, X. Y., Saha, S. K., Sarkar, S., & Giera, B. (2020). Automated Detection of Part Quality During Two-Photon Lithography via Deep Learning. Additive Manufacturing, 101444. https://doi.org/10.1016/j.addma.2020.101444

Saha, S. K., & Chen, S.-C. (2020). Comment on “Rapid Assembly of Small Materials Building Blocks (Voxels) into Large Functional 3D Metamaterials.” Advanced Functional Materials, 2001060. https://doi.org/10.1002/adfm.202001060

Cayll, D. R., Ladner, I. S., Cho, J. H., Saha, S. K., & Cullinan, M. A. (2020). A MEMS dynamic mechanical analyzer for in situ viscoelastic characterization of 3D printed nanostructures. Journal of Micromechanics and Microengineering, 30(7), 075008. https://doi.org/10.1088/1361-6439/ab8bc8

Saha, S. K., Wang, D., Nguyen, V. H., Chang, Y., Oakdale, J. S., & Chen, S.-C. (2019). Scalable submicrometer additive manufacturing. Science, 366(6461), 105–109. https://doi.org/10.1126/science.aax8760

Saha, S. K., Au, B., & Oakdale, J. S. (2019). High‐Speed Direct Laser Writing of Silver Nanostructures via Two‐Photon Reduction. Advanced Engineering Materials, 21(9), 1900583. https://doi.org/10.1002/adem.201900583

Ladner, I. S., Cullinan, M. A., & Saha, S. K. (2019). Tensile properties of polymer nanowires fabricated via two-photon lithography. RSC Advances, 9(49), 28808–28813. https://doi.org/10.1039/C9RA02350J

Prior to 2019

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Saha, S. K., Uphaus, T. M., Cuadra, J. A., Divin, C., Ladner, I. S., Enstrom, K. G., & Panas, R. M. (2018). Kinematic fixtures to enable multi-material printing and rapid non-destructive inspection during two-photon lithography. Precision Engineering, 54, 131–137. https://doi.org/10.1016/j.precisioneng.2018.05.009

Saha, S. K., Oakdale, J. S., Cuadra, J. A., Divin, C., Ye, J., Forien, J.-B., Bayu Aji, L. B., Biener, J., & Smith, W. L. (2018). Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography. ACS Applied Materials & Interfaces, 10(1), 1164–1172. https://doi.org/10.1021/acsami.7b12654

Saha, S. K., Divin, C., Cuadra, J. A., & Panas, R. M. (2017). Effect of Proximity of Features on the Damage Threshold During Submicron Additive Manufacturing Via Two-Photon Polymerization. Journal of Micro and Nano-Manufacturing, 5(3). https://doi.org/10.1115/1.4036445

Saha, S. K. (2017). Geometric Prepatterning-Based Tuning of the Period Doubling Onset Strain During Thin-Film Wrinkling. Journal of Applied Mechanics, 84(5). https://doi.org/10.1115/1.4036325

Saha, S. K. (2017). Sensitivity of the mode locking phenomenon to geometric imperfections during wrinkling of supported thin films. International Journal of Solids and Structures, 109, 166–179. https://doi.org/10.1016/j.ijsolstr.2017.01.018

Saha, S. K., & Culpepper, M. L. (2016). Deterministic Switching of Hierarchy during Wrinkling in Quasi-Planar Bilayers. Advanced Engineering Materials, 18(6), 938–943. https://doi.org/10.1002/adem.201600048

Saha, S. K., & Culpepper, M. L. (2015). Design of a Compact Biaxial Tensile Stage for Fabrication and Tuning of Complex Micro- and Nano-scale Wrinkle Patterns. Journal of Micro and Nano-Manufacturing, 3(4). https://doi.org/10.1115/1.4031382

Saha, S. K., & Culpepper, M. L. (2011). Characterization of the Dip Pen Nanolithography Process for Nanomanufacturing. Journal of Manufacturing Science and Engineering, 133(4). https://doi.org/10.1115/1.4004406

Slocum, A. H., Saha, S. K., & Culpepper, M. L. (2011). Metric mapping: a new method to aid in the design of nanomanufacturing systems. International Journal of Nanomanufacturing, 7(2), 143–157. https://doi.org/10.1504/IJNM.2011.040720

Saha, S. K., & Culpepper, M. L. (2010). An Ink Transport Model for Prediction of Feature Size in Dip Pen Nanolithography. The Journal of Physical Chemistry C, 114(36), 15364–15369. https://doi.org/10.1021/jp105855n

Saha, S. K., & Culpepper, M. L. (2010). A surface diffusion model for Dip Pen Nanolithography line writing. Applied Physics Letters, 96(24), 243105. https://doi.org/10.1063/1.3454777

Saha, S. K., & Choudhury, S. K. (2009). Experimental investigation and empirical modeling of the dry electric discharge machining process. International Journal of Machine Tools and Manufacture, 49(3), 297–308. https://doi.org/10.1016/j.ijmachtools.2008.10.012

Salaün, F., Devaux, E., Bourbigot, S., Rumeau, P., Chapuis, P.-O., Saha, S. K., & Volz, S. (2008). Polymer nanoparticles to decrease thermal conductivity of phase change materials. Thermochimica Acta, 477(1), 25–31. https://doi.org/10.1016/j.tca.2008.07.006

Conference articles

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Kim, H., & Saha, S. K. (2020). Defect control during femtosecond projection two-photon lithography. Procedia Manufacturing, 48, 650–655. https://doi.org/10.1016/j.promfg.2020.05.157

Nguyen, V. H., Oakdale, J. S., Chen, S., & Saha, S. K. (2018). Dosage Compensation for Uniform Printing with Non-uniform Beams in Projection Two-Photon Lithography (No. LLNL-CONF-754187). Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). https://www.osti.gov/biblio/1465273

Ladner, I. S., Cho, J. H., Cayll, D. R., Nguyen, V. H., Cullinan, M. A., & Saha, S. K. (2018). Mechanical Characterization of Additively Manufactured Microstructures Using a Process Integrated MEMS Tensile Tester (No. LLNL-PROC-748753). Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). https://www.osti.gov/biblio/1459147

Saha, S. K., Divin, C., Cuadra, J. A., & Panas, R. M. (2016, September 27). Part Damage due to Proximity Effects During Sub-Micron Additive Manufacturing via Two-Photon Lithography. ASME 2016 11th International Manufacturing Science and Engineering Conference. https://doi.org/10.1115/MSEC2016-8793

Saha, S. K., & Culpepper, M. L. (2013). Predicting the Quality of One-Dimensional Periodic Micro and Nano Structures Fabricated via Wrinkling. 723–729. https://doi.org/10.1115/IMECE2012-87081

Saha, S. K., LaColla, J. J., & Culpepper, M. L. (2013). An Automated Stage for Scalable Imprinting of DNA Nanowires Based on a Self-Aligning Technique. 1043–1051. https://doi.org/10.1115/IMECE2012-87065